Used HITACHI / KOKUSAI DJ-1206V-DF #293630231 for sale

HITACHI / KOKUSAI DJ-1206V-DF
ID: 293630231
Wafer Size: 12"
Vintage: 2007
LPCVD System, 12" Quixace II 2007 vintage.
HITACHI / KOKUSAI DJ-1206V-DF diffusion furnace is an advanced, multi-functional diffusion furnace designed for use in a variety of industries. It is designed to be used with a variety of process applications, including semiconductor, LED, and thin film deposition processes. The equipment features a large, adjustable temperature control range of up to 1250°C, with superior uniformity and is capable of processing up to 4-inch wafers. It is engineered to be extremely energy efficient with a low 20kW power rating, ensuring energy conservation. The furnace is equipped with numerous unique features that allow it to reach higher levels of performance. It is capable of automatic wafer exchange and end point control, allowing for full control over the entire process. It also features a cool process chamber that ensures temperature uniformity and reduces process Thermal Budget by controlling running temperature and maintaining temperature consistency. In addition, it contains an optical emission monitoring system that measures key process parameters and provides feedback such as gas composition and glow discharge measurement. The device also includes integrated Oxygen Injection Unit (OIS) to improve chamber operation by delivering a precise amount of oxygen to the chamber, allowing the user greater control of the process environment. OIS also helps reduce oxidation and keep the chamber clean. In addition, the furnace includes a view port and cleaning tool for convenient sample observation and access for maintenance. It also features full SCADA control to ensure precise, repeatable process control and highly reliable operation. With the integrated data recording machine, valuable process data can be recorded and monitored with ease. HITACHI DJ-1206V-DF diffusion furnace is a compact and reliable diffusion solution, perfect for semiconductor, LED, and thin film deposition applications. With its large temperature range, precise temperature uniformity, low power rating, and many other useful features, it has been designed to make your process optimization easy and cost effective.
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