Used HITACHI / KOKUSAI DJ-1206VN #9377460 for sale

HITACHI / KOKUSAI DJ-1206VN
ID: 9377460
Wafer Size: 12"
Vintage: 2006
PECVD System, 12" Process: ALD 2006 vintage.
HITACHI / KOKUSAI DJ-1206VN is a diffusion furnace and accessories, designed specifically for rapid thermal processing of semiconductor wafers. It is an ideal tool for processes such as thermal oxidation, diffusion, nitridation, and other demanding applications requiring submicron accuracy and repeatability. The furnace features full software-controlled operation, allowing for efficient and conformal heating of the wafers. The furnace is designed for use in fabrication lines where consistent diffusion and other thermal processes are required. It has a vertical profile configuration that can accommodate a batch of four (200mm/8") wafers. The furnace can also accommodate three 75mm (3") wafers and single 100mm (4") wafers, making it perfect for both small and large wafer processing. The furnace is equipped with a unique diffusion set-up consisting of two thermoelectric controllers and a programmable temperature regulation equipment. This enables tightly-controlled heating and cooling cycles, providing repeatable results. The temperature range of HITACHI DJ-1206VN is 300°C~1300°C. KOKUSAI DJ1206VN also features an advanced safety system, providing the user with operator safety and environmental protection from hazardous conditions. These safeguards are built into the unit's design, and include a lockout operation machine when the wafers remain at temperatures above 900°C for more than 5 minutes. The furnace also offers 8 types of programmable oxidation/nitridation/diffusion/annealing processes, which provide the user with the flexibility to carry out the most challenging thermal processes. It also offers 4-programmable time steps for each process. The sophisticated control tool always maintains tight control of the process temperature and prevents thermal runaway and over-temperature. In addition, DJ-1206VN comes with a timer and data communication functions, providing the user with the ability to both monitor and record the temperature and time of each process, making it easy to evaluate the results. To summarize, KOKUSAI DJ-1206VN is a diffusion furnace and accessories, designed specifically for rapid thermal processing of semiconductor wafers. It is ideal for processes such as thermal oxidation, diffusion, nitridation, and other demanding applications requiring submicron accuracy and repeatability. HITACHI DJ1206VN features a vertical profile configuration, two thermoelectric controllers, programmable temperature regulation asset, advanced safety model, 8 types of programmable processes, 4-programmable time steps, timer and data communication functions, enabling users to effectively and precisely thermal process their wafers.
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