Used KOKUSAI CX3000 #9291191 for sale

KOKUSAI CX3000
ID: 9291191
Wafer Size: 12"
Furnace, 12" P/N:DD-1223V Process: H2 ANNEAL.
KOKUSAI CX3000 is a diffusion furnace equipment designed to facilitate the growth of advanced semiconductor devices. It is a multi-zone furnace capable of temperatures ranging from 20-1470 degrees Celsius, making it suitable for use in a wide range of semiconductor applications including epitaxy, oxidation, dopant activation, and oxidation. The system is composed of a base unit, a vacuum chamber, and a number of accessories including an exhaust unit, power supplies, and a graphite susceptor. KOKUSAI CX-3000 features a high temperature ceramic thermal insulation machine and an advanced control tool for precise temperature control and adjustment. The metal alloy susceptor is heated using high-frequency induction heating elements, providing rapid and uniform heating with minimal source degradation. The asset is also able to provide positive temperatures on the surface of the susceptor, allowing for uniform temperature distributions and precise control of temperature profiles. The high-temperature dual-zone process chamber enables precise control of temperature zones and uniform thermal gradients. It is designed with a quartz window and cross coupling designed to ensure uniformity throughout the entire chamber. CX3000 also has a low-temperature susceptor, a graphite susceptor specifically designed for low-temperature processes, and an etching station. CX-3000 model offers significant flexibility in nearly every aspect of its design. It is designed with a user-friendly, open architecture platform to enable easy configuration of the equipment for specific process needs. It is also designed with a modularized component design, offering customers the flexibility to tailor the system for their specific needs. In conclusion, KOKUSAI CX3000 is an advanced diffusion furnace unit suitable for a wide variety of semiconductor applications. It has precise temperature control capabilities, allowing for optimal thermal gradients and excellent uniformity. Its modularized component design and user-friendly interface also allow for a highly customizable and flexible machine that can be tailored to meet the needs of nearly any manufacturing process.
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