Used KOKUSAI DD-803V #293589150 for sale

KOKUSAI DD-803V
ID: 293589150
Wafer Size: 6"
Vintage: 1991
Furnace, 6" 1991 vintage.
KOKUSAI DD-803V is a diffusion furnace and accessories package for the handling of large-scale semiconductor processes. It is equipped with a bridge-style vertical lift unit, high-efficiency heating equipment, and integrated cooling system for optimal process performance. The proprietary vertical lift unit provides fast horizontal directional changes and high flexibility in daily operation. The furnace unit is equipped with three distinct zones, each of which can handle up to 6-inch substrates, thereby giving it the capability to process large substrates with ease. The diffusion chambers are equipped with high-quality pre-calibrated thermocouples, which provide superior control over thermal processes. The heating machine is designed to heat rapidly and evenly, providing uniform temperature distribution across all zones. The temperature range is adjustable from room temperature to 1,200°C and the maximum allowable temperature is 1,275°C. The integrated cooling tool maximizes the utilization of available coolant, to maintain the substrates at a consistent temperature. The cooling process is managed through a sophisticated software platform, ensuring optimal performance. For top reliability, the cooling asset is equipped with a series of nozzles for perfect control. In addition, KOKUSAI DD-803-V is equipped with a gas flow control model which provides precise metering of both inert and reactive gases enabling optimal diffusion performance. The main control unit provides operators with a full touch-screen interface for easy operation and maintenance. Moreover, the equipment is compliant with SEMI S2 and other relevant safety rules, allowing for safe and efficient processes. DD-803V has been specially designed for large-scale semiconductor operations, providing fast and reliable processing for long-term use. The versatility of the vertical lift unit ensures superior flexibility in the daily operation and the temperature range is sufficient to cover almost any substrate processing needs. In addition, the integratedcooling system provides efficient control and the gas flow control unit ensures precision metering. All in all, this is a professional-grade diffusion furnace package suitable for large-scale operations.
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