Used TEL / TOKYO ELECTRON 803 #9254675 for sale

TEL / TOKYO ELECTRON 803 is a single-wafer diffusion furnace and associated accessories. It utilizes a cylindrical cavity, where a wafer is placed on the bottom inside and heated using the bottom edge-cooled hearth design. The high temperature single-wafer diffusion furnace has a capability of up to 1150°C and a uniformity of ±3°C, ideal for oxidation and diffusion processes in the semiconductor industry. The furnace features a PLC (programmable logic controller) for easy operation, with an automated O2 flow measurement and control device and vacuum tight accessories for quick thermal process initiation and end point detection. The furnace also has a Mobile-ENDIS thermal barrier, a device which helps reduce energy wastage by maintaining the uniformity of the thermal barrier during process operations. The user-friendly graphical user interface (GUI) allows for easy setting of process temperatures and gas flows. The programmable logic controller ensures precise control over the process parameters. TEL 803 is equipped with a convection system designed to reduce energy consumption by circulating air inside the furnace, minimizing turbulence and heat loss. TOKYO ELECTRON 803 also features a VCR-40 survey port, ensuring uniformity of the process during operations and a cooling plate assembly for wafer accommodation and manual heating rate adjustment. The VCR-40 port is capable of monitoring the uniformity of furnace temperature and the chemical concentration of dopants within the process gases. It also allows for detailed analysis of data records. 803 also features a remote process monitoring system along with PC-based software for processing and exhibiting usage data and process information. The remote process monitoring system allows for continuous surveillance on all operating parameters without manual intervention. TEL / TOKYO ELECTRON 803 also comes with a number of additional features such as advanced temperature control, Oxidation Armor technology, an easy to access inspection window, and process gas diagnostics. All these features combine to produce an efficient, user-friendly diffusion furnace designed to meet the needs of the modern semiconductor industry.