Used TEL / TOKYO ELECTRON A303i #9315048 for sale

TEL / TOKYO ELECTRON A303i is a high performance, multi-function diffusion furnace and its accessories. It is designed for handling the needs of advanced semiconductor process technology applications. It provides precise temperature control, overtemperature protection, and uniform front-to-back heat distribution. Its advanced temperature uniformity control technology ensures accurate wafer substrate temperature profiling. The furnace employs very large furnace volume which is large enough to handle large batch wafer processing. It also includes an on-board monitoring equipment that enables the user to monitor the process status in real-time. The use of this monitoring system also helps the user to make better decisions and increase the production efficiencies as well as throughput. TEL A303i is designed to be flexible and can be easily integrated with existing process tools. It also has an advanced unit that enables a large variety of configurations to be executed. It is able to support large wafer processes, up to 2,400mm in size. The furnace can be adapted and configured to allow for temperature accuracy of 0.1°C with repeatable temperature control. TOKYO ELECTRON A 303 I is designed to ensure repeatability and high accuracy on temperature profile. It is constructed of high-quality materials and features an integrated quartz reactor for ultra-high temperature operations and a large reaction chamber for optimal volume. In addition, it also includes automated wafer loading and transfer arms for uniform alignment on the wafer. It also features a secure, and corrosion-resistant stainless steel exterior to ensure durability through the wide range of operating temperatures. Moreover, the furnace is designed with minimal heat loss to the environment and excellent insulation. The interior of the reaction chamber is ported with heated gas to maintain precisions temperature inside and underneath the wafer material. TEL A 303 I, also offers a high level of safety with its wide range of safety features. These features include an emergency stop button for immediate shutdown, overtemperature sensor for prevention of process failure, and sealed heat-shielded core for minimal heat release to the surrounding environment. TEL / TOKYO ELECTRON A 303 I is equipped with a fail safe obstacle detection machine that prevents the wafer from dropping into the reaction chamber. It is also compatible with a wide range of accessories for automation and process control. In conclusion, A 303 I is a multi-function diffusion furnace and its accessories that is designed to deliver precise temperature control, overtemperature protection, and uniform heat distribution for advanced semiconductor applications. Its advanced temperature uniformity control technology and wide range of safety features make it an ideal choice for demanding requirements in the industry.