Used TEL / TOKYO ELECTRON Alpha 303i-KVCN #9384011 for sale

TEL / TOKYO ELECTRON Alpha 303i-KVCN
ID: 9384011
Wafer Size: 12"
Furnace, 12" K Type.
TEL / TOKYO ELECTRON Alpha 303i-KVCN is a diffusion furnace designed for use in the development of semiconductor substrates and materials. It offers high accuracy and reliability for advanced materials and processing. TEL Alpha 303i-KVCN incorporates a 3-zone system, each with independent temperature control and separate gas distribution, allowing users to customize their processing for a variety of substrates. It comes with a 1.0kW E-beam evaporator and a graphical user interface (GUI) for control of all processing parameters. The diffusion furnace is fitted with an in-situ mass flow controller, making it incredibly accurate and reliable. It also uses a vertical resistance temperature detector (RTD) and a thermocouple for precise temperature control. An auto calibration system ensures maximum accuracy and repeatability. TOKYO ELECTRON Alpha 303i-KVCN also utilizes a closed-loop pressure control system to maintain optimal chamber pressure during processing. This ensures a controlled reaction of the material being processed, providing repeatable results. The furnace also comes with a high-efficiency vertical quartz bell for better temperature uniformity and increased process yield. It also uses a high-performance oxygen scrubber that removes oxygen from the chamber to eliminate oxidation of the substrates being processed. In addition, Alpha 303i-KVCN is equipped with a single-wafer transfer robot designed to remove the wafer from the chuck after the process is complete. It is also designed to be compatible with a variety of different sized wafers. TEL / TOKYO ELECTRON Alpha 303i-KVCN is an all-in-one solution for semiconductor processing and an ideal choice for manufacturers looking for a reliable and accurate diffusion furnace. The high accuracy, maximum repeatability, and closed-loop systems ensure uniform results and excellent yields.
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