Used CORIAL 300 iL #9272971 for sale

Manufacturer
CORIAL
Model
300 iL
ID: 9272971
Vintage: 2010
ICP Etcher 2010 vintage.
CORIAL 300 iL is an advanced etching and ashing unit deployed in the semiconductor industry. Its platform provides short etching and ashing cycles with high accuracy and repeatability, resulting in a high-quality surface finish. CORIAL 300 is designed for a wide range of etching and ashing needs, from singlecrystal wafers to ashing of multi-site photoresist coating. A variety of processes can be accomplished on CORIAL 300, including chlorine-based etching, silicon etching, and ion milling. CORIAL 300's platform also offers excellent process repeatability. The etching and ashing tool is equipped with sophisticated cooling systems that keep the processing temperature in check, even when changing etch conditions. This allows operators to retain the same number of sites across a range of conditions. CORIAL 300 also has comprehensive ashing capabilities and a built-in feature that prevents cross-contamination between wafers. 300 iL has a standard chamber size of 600 x 600 millimeters and a tolerance of 1 micron when laying out the main chamber. Its automated four-step process includes pre-clean, etch-step, post-etch clean, and post-etch ashing. The process is controlled by a series of programmable logic controllers that can be programmed to execute the sequence perfectly. CORIAL 300 is conveniently powered by a three-phase AC input, and its power consumption is minimal at less than 0.5 kW. The operating ambient temperature of CORIAL 300 is between 15 °C and 40 °C, and the relative humidity is between 10-90%. CORIAL 300 also offers low-noise operation, with a sound pressure level of only 62 dBA at a distance of 1 meter. In order to keep CORIAL 300 operating in peak condition, operators should perform maintenance when necessary. In order to keep CORIAL 300 up to date, its software should be updated on a regular basis to ensure optimal performance. Overall, CORIAL 300 iL is an advanced etching and ashing unit that is capable of providing excellent process repeatability and high-quality results. Its sophisticated cooling system, automated four-step process, and low-noise operation make it an ideal choice for the semiconductor industry.
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