Used HITACHI 300LE #293667223 for sale

Manufacturer
HITACHI
Model
300LE
ID: 293667223
Vintage: 2006
Ashing system 2006 vintage.
HITACHI 300LE etcher is a highly capable etching and ashing equipment used for high precision and high speed ablation and etching of microelectronic devices. 300LE is a rugged and reliable vacuum etcher/asher that principally uses etch chemistries of carbon, nitride and oxide. HITACHI 300LE is equipped with a full sized stepping motor system capable of ensuring precise control and positioning in X, Y and Z directions. It is capable of delivering substrate etching speed up to 1150mm/s for rapid etching of microcircuits and superconductors. The etcher/asher unit offers precise position control and advanced temperature and time control features. It also offers a SCA parameter for managing substrate temperatures as well as a WCA parameter for controlling time. Its high resolution display comes with high brightness LCD and a graphical user interface that allows users to easily operate and monitor the whole machine. 300LE has in-line process controls including cyclic waveforms for arc control, gas flow proportional controller for etch chemistry supply, hydro scrubber with drain outlet for solvent evaporation, chamber inert gas recirculating tool and Y-axis, X-axis and Z-axis motion control asset. Additionally, HITACHI 300LE etcher features a high level of safety and ergonomic design, with safety covers, a vacuum safety detector and an emergency stop switch. It has a broad range of process control features, allowing its users to optimize their etch and ashing processes for multiple substrates. 300LE also offers low, medium and high etching speed options, and a wide range of etch chemistries for quick removal of any oxide, nitride and carbon-based resist layer. Overall, HITACHI 300LE etcher is an excellent choice for high precision and high speed etching of microelectronic substrates. With its reliable etch chemistries and precise position control it allows users to achieve high quality results in both etch and ashing processes.
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