Used LAM RESEARCH 4520 #9189989 for sale

LAM RESEARCH 4520
Manufacturer
LAM RESEARCH
Model
4520
ID: 9189989
Wafer Size: 6"
Poly etchers, 6" Includes: RF Generators Cables Manuals and all components Currently de-installed.
LAM RESEARCH 4520 is an etcher or asher, in which a plasma or gas takes the place of the liquid or paste chemicals used in the traditional etching or ashing process. The equipment is used primarily in the manufacturing and testing of semiconductor devices. It is a vertical system, typically 24" to 30" wide, which includes an etching chamber, a vacuum chamber and ancillary equipment. It is generally constructed entirely of stainless steel or aluminum alloy in order to maintain a clean room environment during operation. The etching chamber has a showerhead-type RF power distribution operated at up to 200V. This powers a plasma stream which confronts and etches the surface of the wafer. A vacuum chamber is immediately adjacent to the etching chamber. It can be maintained at internal pressures down to 10 mT, through the use of turbo-molecular pumps. Using 4520, a wide range of etching chemistries can be achieved. A gas-assist mode elevates the etching efficiency for etching photoresist films, as does the variable voltage capability. The Etching chamber exclusively uses one or more CxF6 (hexaflouroprene gas) gas, mixed with various other etching gases, depending on the particular process. LAM RESEARCH 4520 has multiple polarity and sheet magnetic field configurations allowing the operator to control the shape of the etch. Gas flow meters and sensors, as well as a wide variety of temperature and humidity sensors and control systems, are used to precisely control the process parameters. 4520 is configurable with multiple process tools and a variety of isolated zones to allow for simultaneous etching of multiple wafer types or dies. Additionally, display interfaces, gas mixing and delivery systems, wafer carriers, shutters, and vacuum systems are all designed to circuit test and imaging requirements. The unit offers precise control of the process variables to assure repeatable results and has proven highly reliable and precise. With excellent process control and repeatable results, LAM RESEARCH 4520 models have been widely adopted in the semiconductor industry. With its excellent plasma generation and sophisticated control machine, 4520 is a reliable and cost-effective tool for etching and ashing in the semiconductor manufacturing process.
There are no reviews yet