Used MARCH PM-600 #9160093 for sale

Manufacturer
MARCH
Model
PM-600
ID: 9160093
Plasma asher Large barrel bench top RF power supply: 13.56 Mhz Advanced energy RFX-600 power supply Output power: Up to 600 Watts (2)Gas input plus N2 Inside diameter: 10" x 12" Quartz tray: 8" x 8".
MARCH PM-600 etcher / asher is a powerful, automated etcher and asher designed for use in the semiconductor industry. It uses plasma etching and reactive-ion etching (RIE) to create precise, high-aspect ratio features on wafers and other substrates. PM-600 is designed for the high-volume manufacturing of precision devices, such as integrated circuits and other nanoscale components. MARCH PM-600 is a high-throughput etcher / asher designed to minimize the time required for etch-production. It has an automated process chamber that is sealed and operated in an ultra-clean, controlled environment. The process chamber has a low pressure, low temperature etch operation, allowing for tight control over the etch rate. The process chamber also features a dual-source equipment, which allows independent control of both the etchant and the etch target. This dual-source system allows for fine control over the etch rate and inversion-edge etch profiles. PM-600 is equipped with a variety of features designed to facilitate the etching process. It features a high-resolution in-line imaging unit, allowing for fast, accurate alignment. It also has a universal gas panel, allowing for precise control of the etch chemistry. MARCH PM-600 is also equipped with a real-time particle monitor and an etch-by-step, two-dimensional profiling capability that provides dynamic etch adjustment according to user-defined setpoints. PM-600 provides the conformal etching and high-throughput capabilities necessary for efficient production of precision devices. Its in-line imaging machine and controlled environment play an important role in creating high-aspect ratio features on wafers and other substrates. MARCH PM-600 allows for a variety of etch-process recipes, including ion etching, chemical etching, and etching-by-step profiles programmed via digital controller technology. This unit also features a universal gas panel, allowing for precise control of the etch chemistry. PM-600 is designed for use in the semiconductor industry, providing efficient, versatile etching capabilities to meet the processing needs of the nanodevice industry.
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