Used MARCH PX-250 #9156391 for sale

Manufacturer
MARCH
Model
PX-250
ID: 9156391
Plasma etcher (3) Shelf configuration Dual flow raters for gas 300 or 600 Watt RF Generator.
MARCH PX-250 is an etcher-ashers equipment that has been designed to offer advanced dry processing capabilities across a variety of applications in categories spanning from industrial to medical. This efficient and cost-effective tool creates precise and consistent profiles on a variety of substrates using four different process techniques to achieve desired results. The system employs high-tech components, including a power supply, resistive heater, vacuum chamber, as well as two integrated etch and ashers chambers, to deliver outstanding operation and performance. MARCH PX 250's main feature is its high stage of etch and asher performance. The unit employs a resistive heater and a close-coupled high power vacuum chamber to ensure that the temperature inside the etching chamber remains consistent and safe for etching and ashing processes. Additionally, the machine is self-regulating and includes local controls to allow users to adjust parameters such as temperature, gas flow, and pressure as well as deposition cycle time. Furthermore, the entire tool is controlled by a computer-assisted procedure to ensure that each etch and asher process is completed safely and properly. The asset also incorporates two independent etch and asher chambers. Each chamber utilizes different process techniques, allowing the operator to control the concentrations of etch- and asher-gas species. The chambers' separate heating elements also help to ensure that the correct gas profile is maintained throughout the entire process. In addition, the chamber includes a remote plasma etcher in order to deliver nanometer precision etching. The etcher also produces a mid-frequency pulse per cycle, enabling the operator to fine-tune the process to obtain better results. PX-250 offers a variety of other features to make the process more efficient. Its automated gas scrubber removes process gas before entering the chamber, allowing for a cleaner etch and asher processes. Additionally, the model's gas-control mechanisms enable precise control of pressure, while its advanced atmosphere regulation improves the stability of the process. Finally, PX 250 can be combined with additional material handling systems, such as a wafer batch loader or a wafer single loader, to enable streamlined dry processing tasks. In conclusion, MARCH PX-250 is a high-performance dry processing tool offering advanced etch and ashers capabilities. This etcher-asher equipment can employ four different process techniques to achieve precision on a variety of substrates and with adjustable parameters, allowing users to obtain the desired results. Additionally, the system includes two independently heated etch and asher chambers, an automated gas scrubber, and a remote plasma etcher to deliver nanometer precision etching.
There are no reviews yet