Used MATTSON Aspen II #293619551 for sale

MATTSON Aspen II
Manufacturer
MATTSON
Model
Aspen II
ID: 293619551
Wafer Size: 6"
Vintage: 2007
ICP System, 6" 2007 vintage.
MATTSON Aspen II etcher/asher is a cutting-edge equipment used for Copper, Aluminum, andother metallic etching and ashing processes. It is designed to deliver benefit to a host of industries, including semiconductor packaging, PCB, and MEMS. It is capable of handling wafers up to 8" in diameter, with a maximum etch/ash chamber size of 26" x 13.5" x 10". Aspen II is equipped with a digital vacuum system, providing pinpoint control over pressure and temperature. This digital pressure management enables the unit to maintain an optimal process atmosphere, with a wide range of Chemistries. The digital vacuum machine also ensures uniform process uniformity for each recipe. MATTSON Aspen II is also equipped with a programmable end point feature, which allows for predefined operating parameters to be set for each recipe, so that a precise etch/ash cycle can be performed each time. This ensures repeatable results regardless of operator, batch size or process conditions. The process chamber of Aspen II features perforated walls, providing a uniform distribution of process gases and etch chemistries, while also enabling a wide range of downstream etch rates. This perforated wall design also enhances the etcher/asher's cleaning capability, resulting in a clean chamber between process cycles. MATTSON Aspen II features a multi-zone RF generator, allowing for a combination of repeatable process cook times and ample power to meet your specific application. Aspen II also features an advanced self-purge cycle, which enables fast post-process recovery and repeatable etch/ash performance. In addition to the etch/ash process capabilities, MATTSON Aspen II is capable of performing a wide range of post-process operations, such as electrochemical plating, corrosion prevention, and coating. Aspen II etcher/asher provides a robust and reliable processing platform, with enhanced process control and repeatability. It also provides a wide range of post-process options, allowing for end-to-end or stand-alone processing in a single tool.
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