Used MATTSON Aspen II #9230723 for sale
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ID: 9230723
Wafer Size: 8"
ICP System, 8"
Wafer type: Silicon
Chamber type:
Rear chamber: ICP Chamber
Cool chamber
Mainframe options:
Cassette nest: SMIF Cassette nest
Operator interface: Operator interface, 18" with SMIF
Paddle selection: Adjustable paddle
Panel / Skin color: White
Sub-frame: Tall frame
Light tower: Pole mount, (4) colors
Wafer sensors: Cassettes & paddle sensors standard silicon
Paddle O-rings: KALREZ
Slotted groove slit door type without regulators
Loadlock manometer: 100 Torr
Shuttle manometer: 1000 Torr
Hinged cooldown chamber
Cooling chamber skin
Remote operator interface panel
Rapid cassette exchange
System skins for sub-frame & AGV: Standard skins for TALL sub-frames with EMO
No wafer mapping
No secondary interface PCB
SMIF Option
PCB Part: V VERSA COM +4
No robot safety enclosure
SECS / GEM-1 Interface: VERSA COM +4
Gas panel type:
Top of short frame
Cabinet with door
Gas panel facilities: Bottom gas feed with CDA regulator
Mainframe exhaust options: Ceiling exhaust flange for external hookup & ductwork
Vacuum fitting connections: KF50 Vacuum connections standard
Shrouded locking EMO type
EMO Button guard ring
Panel interlock options: Mechanical interlock switch
Chamber configurations:
Temperature control: Watlow temperature control panel standard
ACX 1201 Pressure control with ext PS
No MATTSON endpoint system
MFC Type: MFC on Core
MFC Cal gas: N2
Gas delivery options:
Gas 1 / 10000 / O2
Gas 2 / 200 / CF4
Gas 3 / 5000 / N2
RF Components:
RF Match: TRAZAR AMU10-D2
(2) RF Generator racks: ENI / RFPP / ADTEC class B generators
Generator type: ENI OEM12B
Power supply: 208 V, Single phase
Cable length: 60" RF Cables with cesar 1312 gens
MFC With core chamber
Installed:
Heater jackets on isolation valve, throttle valve & foreline
HEPA Mini-environment with blower & ULPA filter
Bracket sensor lift pin (Up / Down), 062-00017-00
Bracket sensor side slit door (Bottom / Upper), 053-00018-00 & 053-00011-00
Pneumatic manifold (4) stations:
2-4 Ports (Middle)
3-8 Ports (Lower)
Regulators, 0-150 PSI
With gauge for slit doors & lift pins up / Down
Power supply:
Line frequency: 50/60 Hz
Line voltage: 200/208 VAC, 3 Phase, 60 Amp, (5) Conductors
AC Power: Mainframe AC box, 208 V, Single phase
CE Marked.
MATTSON Aspen II is an etching and ashing process tool specifically designed for advanced process integration. It features process flexibility and high throughput, making it ideal for research, development and device manufacturing applications. Aspen II features many unique process modules which are easily integrated into the alignment, including the quenching, evaporation and etch modules. The quenching module is controlled by high frequency pulsing, allowing precision control over process parameters. The evaporation module uses a high rate, energy efficient, RF heating source for evaporative deposition of materials. The etch module features a free, optional DC loading equipment for direct current etching and ashing, as well as high-speed pre-etch programs and gentle post-treatment. MATTSON Aspen II is designed with a wide range of configurations and temperature ranges. Its Gas Source Injection System™ is capable of delivering gases through a range of calibrated, uniform processes. The integrated multi-ionized vacuum unit creates a clean, low-pressure environment over a range of process steps. All chambers are accessible and interchangeable, ensuring process flexibility and high throughput. Aspen II's intuitive control panel is designed to ensure excellent control of the entire process and allows for easy data collection and reporting. MATTSON software package also provides customized data and recipe management for various processes. The advanced touch-screen interface allows for easy machine navigation, enabling accessibility even for novice users. MATTSON Aspen II is the perfect solution for integrated, advanced process integration. Boasting high throughput, process flexibility, easy data and recipe management, easy access and wide range of configurations, it is the ideal tool for production or research applications.
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