Used MATTSON Aspen II #9401067 for sale

Manufacturer
MATTSON
Model
Aspen II
ID: 9401067
Wafer Size: 8"
Vintage: 1994
Dryer, 8" ICP Chamber Chamber Process: Ashing GEM and SESC Interface Cool down chamber Cassette stage Transfer robot AC Power box Signal tower (2) ADVANCED ENERGY CESAR1312 RF Generators DC and AC Power supply Chuck type: Standard MILLIPORE Manometor Chamber Pump Gate valve Thermocuple Heater Pressure switch Board (3) Control boxes Power tap Hard disk Throttle valve EMO Pipes Cable LCD Monitor Control panel PC Included Missing parts: Robot blade Robot extention geneva Robot extention gear Robot rotation genva Robot rotation gear Robot motor Side slit door Shattle pressure gauge Shattle chamber slit door Shattle motor Power supply: 208 V 1994 vintage.
MATTSON Aspen II is a state-of-the-art electrochemical etching/ashing equipment designed for use in a wide range of applications within the semiconductor industry. The system features advanced electronics for precise control of etching and ashing processes, allowing for flatter, thicker layers on wide-ranging substrates. It comes equipped with an advanced nozzleless bath unit, which provides precise and precise control of the stripping process, allowing for predictable and repeatable results. Additionally, the integrated self-cleaning machine keeps the tool operating at peak performance by automatically eliminating contamination build-up. The asset is engineered to be reliable and efficient, from its innovative nozzleless solution to its fast-etching capabilities. Aspen II is capable of processing up to 50 wafers per hour at a maximum temperature of 475°F and can be used for a variety of materials, including silicon, aluminum, tungsten and titanate. The integrated software interface allows users to optimize settings and adjust model settings for efficient operation. Furthermore, it offers an eco-friendly solution, limiting solvent emissions, thanks to its high efficiency vacuum pump and gas flow sensors. This helps to ensure that etching and ashing processes are in compliance with environmental and safety regulations. The innovative design of MATTSON Aspen II also facilitates maintenance, allowing easy access to all internal components. In addition, the equipment's controller manages the etching process from the source to the substrate, provided a precise and repeatable deposition and removal rate. Furthermore, the precision gas delivery system ensures precise and uniform gas flows for optimized etching and ashing processes, helping to reduce process variation and yield better results. Aspen II is a powerful and reliable electrochemical etcher/asher unit. It provides precise and repeatable control for etching and ashing processes, resulting in flatter, thicker layers on wide-ranging substrates. In addition, the machine's sophisticated electronics ensure reliable and efficient performance, while its integrated self-cleaning tool and gas flow sensors ensure compliance with environmental and safety regulations. Furthermore, its innovative design allows for easy maintenance and precise gas delivery, resulting in superior results with minimal process variation.
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