Used PLASMA ETCH BT-1/C #9328696 for sale

Manufacturer
PLASMA ETCH
Model
BT-1/C
ID: 9328696
Plasma cleaner RF Generator: 600 W Rack / Electrode chamber Process: Oxygen / Argon cleaning of thermoplastic PCB Surface at low power Cooling unit: Vacuum pump Heating unit: Process chamber Computer monitor Light tower WIP Tracking PC screen Chamber main door PC Access door Main power switch WIP Tracking scanner Pen with touch screen Does not include electrode.
PLASMA ETCH BT-1/C is a high-performance asher and etcher designed for a variety of plasma etching applications. This unit is available in a variety of sizes, depending on the application. The equipment includes a plasma source, multiple gas sources, and a computer-controlled plasma chamber. The plasma source is powered by a forced-air RF generator. The plasma source direct plasmatron creates a highly stable plasma with low potential variation. This provides optimum for etching. Multiple gas sources are included, providing oxygen, hydrogen, nitrogen, and other plasmas gases. The computer-controlled gas delivery system precisely regulates the gas flow rate, pressure, and chamber temperature. The RF generator supplies RF power to a single electrode, creating a uniform electric field in the enclosure. The process parameters are precisely regulated via a control panel, with an intelligent interface including auto tuning, alarm and safety functions. The chamber features excellent thermal control, uniform plasma producing, and an integral cathodic arc source. The gas distribution unit, with its multiple inlets and outlets, ensures uniform thermal control throughout the entire process. The enclosure geometry is specifically designed to promote turbulence, ensuring uniform etch depth and etch rate. The chamber walls are designed and tested for high performance, providing corrosion and chemical resistance. The walls are also designed to minimize plasma deposition onto the walls, resulting in clean processes. The design is also engineered to reduce EMI, which is necessary in modern applications involving sensitive electronic components. The machine also features a computer-controlled vacuum tool to control the chamber pressure. This ensures an optimal pressure balance, allowing for reliable etching performance. The asset also includes an integrated mass flow controller for precise process control. The integrated model monitors temperature control and vapor pressure, as well as oxygen and argon levels. PLASMA ETCH BT-1/C is a high-performance etcher and asher that's designed to deliver precise, repeatable results. With its multiple gas sources, automated control, and robust design, the BT-1/C is an ideal tool for a variety of plasma etching applications.
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