Used SAMCO RIE-1C #9357610 for sale
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ID: 9357610
Reactive Ion Etcher (RIE)
Vacuum chamber:
Quartz: 212 mm diameter
Rectangular view port at front panel
Hinged lid with front mounted handle
Mesh cover
Electrodes:
Parallel plate design
Cathode coupling (RIE) mode
Distance: 44 mm (Fixed)
Upper electrode:
Aluminum
Diameter: 140 mm
Shower-head gas dispersion system
Lower electrode:
Type: Cathode (RF electrode)
Stainless steel
Diameter: 120 mm
Water cooled
Special tray:
Aluminum
Diameter: 120 mm
Maximum substrate size: 100 mm
RF Power source:
Solid state power generator
Crystal control
Power: 13.56 MHz, 200 W (Maximum)
RF Power interlock
With chamber lid
Vacuum pump:
Double stage rotary pump
Flow rate: 240 l/min
With PFPE pump fluid
Oil mist filter
Solenoid operated nitrogen gas ballast control valve
Couplings with metal vacuum hose
Vacuum gauge:
Capacitance monometer: 0-2 Torr
Gas delivery and inlet system:
(2) Mechanical flow meter controlled lines: CF4 / O2
Nitrogen purging line
Flow range: 0-20 SCCM
Timers:
Digital for process time: 0-99 Seconds, minutes / Hours
Resolution: 0.1s
Adjustable purging time: 0-60 Seconds
Audio alarm
Utilities required:
Step-down transformer
Cooling water: 2 Liter/min
Supply pressure: 15-20°C, 0.1-0.2 MPa
Supply and return connection: RC 1/4" and 1/4" O.D Tubing
Depth filter: 20 µm
Process gas supply: 0.1 MPa (15 psig)
Connection: Swagelok fittings, ¼"
Filters: 2 µm
Safety features:
Door interlock
Pressure interlock
Pressure reached alert
Venting:
Exhaust duct for pump
NW 25 Rotary pump exhaust
Power supply: 100 VAC, 15 A, Single phase.
SAMCO RIE-1C is a Rapid Ion Etcher (RIE) made by SAMCO, Inc. It is designed for etching and ashing of a variety of materials. This heavy-duty etcher uses an electronically controlled high-power RF generator to produce a highly reactive ion beam, which can etch or ashing a variety of materials. The equipment is suitable for use in chemical laboratories, research centers, universities and high-tech industries. The main feature of RIE-1C is its high power RF generator. This generator can produce a power up to 4.2kW, allowing for quick etching and ashing processes. It is also equipped with a digital controller for precise power control and pumping speed. This controller has a digital display console, allowing the user to easily adjust the power and other parameters for different etching and ashing procedures. In addition, the etcher has a multi-layer structure. The outer layer (cathode) is made of heavy alloy material, and the inner layer (substrate) is made of titanium alloy. This double-layer structure enhances the ion beam and ensures a consistently high quality of the etched material. The RF generator is powered by direct current, which is supplied from an external capacitor. This helps to ensure an uninterrupted supply of power, even during long-term etching and ashing processes. SAMCO RIE-1C comes with a range of accessories, including a water cooling pump, gas tank, RF coils, an auto-focusing lens, and a gas feed adapter. This allows for a variety of different etching and ashing applications. As an extra feature, RIE-1C also has an anti-backlash structure to keep the etched and ashed material in place. In conclusion, SAMCO RIE-1C is a powerful etcher and asher, particularly suited for use in chemical laboratories, research centers, universities, and high-tech industries. It has a high-power RF generator, a digital controller, and a double-layer structure, providing consistently high-quality etched and ashed materials. RIE-1C also comes with a range of accessories to allow for a variety of different etching and ashing applications.
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