Used STS / CPX Multiplex ICP #9210326 for sale

STS / CPX Multiplex ICP
ID: 9210326
Wafer Size: 6"
AOE Oxide etcher, 6".
STS / CPX Multiplex ICP (Inductively Coupled Plasma) is an advanced etching/ashing equipment designed for use in semiconductor manufacturing. It is a semiconductor device fabrication system that uses the power of induction to etch patterns onto the surface of wafers. It uses a powerful, ionized gas plasma to create patterns down to the smallest details at a high level of accuracy. The plasma is created by the coupling of two radio frequencies to a gas, such as a fluorinated gas, to produce ions or electrically charged particles. These charged particles travel at incredibly high velocities in an enclosed chamber and react with thesurface of the sample wafer, creating an etching pattern. The electrons that make up this plasma are accelerated through the circuit board, creating a high speed propulsion process that allows the detailed etching to take place. STS Multiplex ICP is well known for its ability to create sub-micron patterns with extremely high precision. The etching is carried out in a high vacuum chamber for maximum control over the plasma environment, and thanks to advanced components and custom software, the unit can create elaborate patterns with high-speed precision. CPX Multiplex ICP can operate in passivation mode, which uses layers to protect any exposed metal on the sample. This reduces the risk of damage or contamination when etching in a reactive environment such as a cleanroom. The machine is also suitable for etching into hard materials such as quartz, alumina, and sapphire, allowing users to etch intricate and detailed structures with precision. Overall, STS Multiplex ICPAsher is an incredibly valuable tool in the semiconductor industry. Its unique combination of speed, accuracy, and pattern precision makes it the perfect choice for manufacturers who need to create intricate patterns on their substrate material. Its sophisticated tool design, advanced components, and protection-friendly modes make it an excellent choice for high-quality, high-throughput production of precision-etched components.
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