Used EATON NOVA NV 10-80KV #9287429 for sale

EATON NOVA NV 10-80KV
ID: 9287429
Ion implanter.
EATON NOVA NV 10-80KV is a high-performance and sophisticated ion implanter and monitor used in many industries for higher levels of accuracy and precision. The unit is designed for a wide range of implantation applications from very thin layers to high depths. This unit features a powerful, high-speed linear accelerator, which enables high energy and high precision implanting at the same time. With NV 10-80KV the user can optimize implantation depths from 0 to 80 keV with a resolution of 0.1 keV. The accelerator, in combination with a precision beam scanning system, ensures a homogenous implantation over the entire object. The unit has a wide range of customization options tailored to different implantation requirements. It features a fully integrated Control Console with adjustable parameters for accelerating voltage, total dosage, directional force, source-to-target distance, implantation angle, and spot size. This allows for a more precise, efficient, and targeted implantation. EATON NOVA NV 10-80KV can also accommodate a wide variety of chips due to its expansive array of chip-specific sample holders. Its sample holders adapt to all common wafer sizes and types, ensuring maximum versatility and accuracy for a variety of implantation requirements. The user can rely on NV 10-80KV's reliable, secure implantation monitoring system to ensure the highest levels of implantation accuracy. This system communicates with various external systems such as X-ray, path profiling, and chamber pressure monitors to provide real-time monitoring of the implanting process. The ion implanter and monitor are designed for ease of use and operator safety. EATON NOVA NV 10-80KV features sophisticated, programmable safety parameters that can be individually tailored to a specific implantation process by the user. This ensures that the unit meets all relevant safety and quality standards and can be used with confidence. NV 10-80KV is a highly advanced and sophisticated ion implanter and monitor and offers the ultimate level of control, accuracy, and precision. It is an ideal choice for implantation processes that demand precision and quality, and the wealth of features make it a very versatile choice for a wide range of implantation applications.
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