Used PVA TEPLA Evolution II Twin #9354499 for sale

ID: 9354499
Wafer Size: 4"
Scanning Acoustic Microscope (SAM), 4" (2) OLYMPUS Transducers (2) PCs Operating system: Windows XP Equipped with: Pegasus motion controller PVA Hilbert filter RP H1 Remote pulser Pulser and receiver unit.
PVA TEPLA Evolution II Twin is an advanced dual-beam ion implanter and monitor. This state-of-the-art tool provides advanced technological capabilities for ion implantation, monitoring, and control. PVA TEPLA Evolution Twin has a full-size 8" end station and a 6" side station, which provides greater flexibility and throughput. The high-power monitor station allows for precise process control. Furthermore, the advanced beam alignment equipment ensures highly accurate energy, current and lateral profile control. This results in reduced particle accumulation and less surface contamination, allowing for improved overall process quality and reduced machine downtime. Evolution II Twin utilizes a high-grade beam line with interchangeable inserts, allowing you to configure the system for optimal performance. The beam line is engineered for flexibility, rated for high dose rate and incorporates proprietary linear scan and segmentation techniques. It also has quick-change ion sources and robust source holders that allow for interchangeable sources within minutes. The advanced material and equipment monitoring unit provides you with quality assurance and process control through real-time beam current reports, as well as automatic beam off-line detection and error reporting. Other features include an integrated Bias-Tuning Machine, for high-precision controllability at the wafer level, as well as a real-time sputter monitor that monitors ion energy and beam intensity directly. PVA TEPLA Evolution II Twin has an intuitive user interface, designed with advanced alarms and diagnostics for optimized equipment and process monitoring, as well as an integrated data-logging tool for traceability and process execution records. The simple-to-use high-level software provides easy parameter manipulation and enhanced process repeatability. Overall, Evolution II Twin is a powerful tool, engineered for flexibility and optimized is process quality, throughput, and reliability. With its advanced ion delivery asset, integrated monitoring and control, and intuitive user interface, it is one of the leading ion implanters and monitors on the market.
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