Used SEN / SUMITOMO EATON NOVA GSD-III 90 #9226322 for sale

SEN / SUMITOMO EATON NOVA GSD-III 90
ID: 9226322
Wafer Size: 8"
Vintage: 1995
Implanter, 8" 1995 vintage.
SEN / SUMITOMO EATON NOVA GSD-III 90 is a highly powerful ion implanter and monitor equipment offering reliable and precise performance. It is designed with state-of-the-art ion implantation technology, ensuring both efficient operation and unparalleled accuracy. SEN GSD-III 90 offers a wide range of customized analysis and processing capabilities, allowing a highly diverse range of applications in semiconductor manufacturing. Its ion implantation and monitoring capabilities provide superior control over a wide range of parameters, allowing for highly precise implantation. The system is equipped with a powerful ion source capable of delivering en masse implantable ions with a high degree of accuracy. The independently adjustable mask plates offer further control and enable a wide range of implantation parameters to be tailored to specific needs. SUMITOMO EATON NOVA GSD-III 90 is further equipped with an advanced high voltage supply, allowing the use of very high energies. GSD-III 90 is also equipped with advanced monitoring capabilities, allowing for detailed real-time observation of the entire operation. The unit's sophisticated software allows the user to monitor the rate of implantation, the concentration of implanted ions, the rate of diffusion, and much more. The machine is also capable of sophisticated post-processing of recorded data, enabling the efficient and precise analysis of results. SEN / SUMITOMO EATON NOVA GSD-III 90 is built to last. Its robust construction and advanced components ensure a long lifetime with minimal maintenance or servicing requirements. The tool is self-protected against overloading and contains several safety features which ensure it operates within optimal parameters. In summary, SEN GSD-III 90 is a reliable, efficient, and highly accurate ion implanter and monitoring asset. Its innovative technology enables users to accurately implement and observe the progress of a wide range of applications. The model is highly customizable, and its advanced features ensure lifelong reliability and optimum performance.
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