Used SEN / SUMITOMO EATON NOVA NV 10SD-80 #9268760 for sale

SEN / SUMITOMO EATON NOVA NV 10SD-80
ID: 9268760
Wafer Size: 6"
Ion implanter, 6".
SEN / SUMITOMO EATON NOVA NV 10SD-80 is a state-of-the-art ion implanter and monitor used in the semiconductor industry. It offers high-precision control for implanting particles and ions into conductor substrates and monitoring their performance. It is an ideal tool for a variety of research and development applications. The NOVA SEN NV 10SD-80 is a full-featured ion implanter and monitor that is easy to install and use. It comes with an integrated 100mm octagon vacuum chamber that is capable of performing ion implantations up to a maximum acceleration voltage of 80 kV. The equipment also integrates a leading-edge ion optical simulator that accurately models the performance of the implanter and monitor. SUMITOMO EATON NOVA NV-10SD-80's user-friendly and intuitive control system allows users to program implanting operations accurately and quickly. The unit includes a powerful set of software programs, allowing the user to control the implantation process from simple operations to complex functions. The software also includes a flexible data logging machine for efficient data management. The tool offers an advanced set of features to optimize implantation accuracy and particle stability. It includes high-precision slit scanning that is capable of measuring the exact size of the implant for a uniformly distributed implantation within the substrate. It also offers a variable pulse width for a controlled rate of implantation and adjustable loading and unloading settings to provide uniform implantation in various conditions. SEN / SUMITOMO EATON NOVA NV-10SD-80 also integrates a high-accuracy four-way adjustable aperture scanning asset that is designed to measure and monitor the uniformity of implantation over the substrate. The model also offers a variety of different chamber baffles that are tailored for specific implantation conditions. Automated vacuum control and safety features protect the equipment from over-pressurization and contamination of the implant. NV-10SD-80's advanced monitoring capabilities allow users to observe and measure the implantation process in real time. It features a digital display and a control computer that is capable of providing automated feedback for a more efficient work flow. The system's intuitive user interface allows users to quickly understand and control the implantation process. Overall, SUMITOMO EATON NOVA NV 10SD-80 is an advanced and powerful ion implanter and monitor that offers high-precision control for implanting particles and ions into conductor substrates and monitoring their performance. It provides a secure and efficient platform for a variety of research and development applications.
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