Used SEN / SUMITOMO EATON NOVA NV-GSD-80 #9268769 for sale

SEN / SUMITOMO EATON NOVA NV-GSD-80 is an ion implanter and monitor equipment, designed for applications involving the implanting of ions in materials such as semiconductors, ceramics, and glasses. It features an extremely high accuracy and performance and is suitable for applications requiring constant monitoring and accurate control of sub micron features. The system uses an ion source to generate charged atoms or molecules, which are then implanted into the material by an electric field, resulting in the formation of micro-features. This is followed by the process of monitoring, where an electron microscope and other instruments are used to measure the sub-micron features. This data is then used to adjust implantation parameters and optimize their performance. SEN NV GSD-80 features a high-performance ion implanter with a maximum beam current of 80mA and a fixed beam energy of 2.5keV. It includes an X-Y manipulator, which can be used to adjust the beam along two axes independently. It also has an automatic wafer transport unit, which is used to position and load wafers. The monitor unit of the machine has a series of instruments and sensors that measure and monitor the results of the implanting process. It has an electron microscope tool for examining the sub-micron features, as well as multiple detectors, including Faraday cups, photodiode detectors, and impact ionization detectors. It also has a beam control asset, which can be used to adjust the beam current, beam size, and beam position in order to optimize the results of the implantation process. The model also includes a particle mass spectrometer for analyzing the elements and isotopes of the material before and after implanting. It also includes an energy dispersive spectrometer for analyzing the composition of materials and other chemical and physical properties. The equipment is equipped with a digital control unit, which allows the user to adjust the various parameters such as the beam current, implantation depth, and beam energy. It also has a network interface for connecting to a computer and other networks, enabling remote access and control of the system. Overall, SUMITOMO EATON NOVA NV GSD 80 is an advanced unit designed for implanting ions in materials with high accuracy and performance. It features a high-performance ion implanter, an electron microscope, and a number of detectors and sensors that are used to monitor the results of the implantation process. It also has a Digital Control Unit for adjusting various parameters, as well as a network interface that enables remote access and control.