Used SUMITOMO KC-200A09 #9375864 for sale

ID: 9375864
Carrier washer.
SUMITOMO KC-200A09 is a high performance ion implanter and monitor equipment designed to meet the latest advances in ion technologies. It is specifically designed and engineered to meet the demands of advanced technology, providing an efficient and effective tool for a wide range of ion implantation applications. KC-200A09 can be operated with a variety of beam current values, allowing users to select the energy level and dose best-suited for their applications. With its high-speed scanning mechanisms and improved digital signal processing capabilities, the system provides superior accuracy and maximum flexibility for a wide range of ion implantation techniques. SUMITOMO KC-200A09 features a unique, Dual-Table ion source configuration that offers exceptional accuracy and stability. The two-table source design supports uniform ion beam uniformity and provides high-accuracy positioning. By making use of two independent actuator signals, it also ensures that the sample is positioned precisely and accurately on the implantation table. The monitor module of KC-200A09 delivers improved beam stability and accuracy. It features an improved beam amplifier circuit and an advanced beam delivery unit to accurately control the full range of ion beam parameters. It also offers users an easy-to-use graphical user interface (GUI) to control and adjust beam parameters for specific applications. In addition, SUMITOMO KC-200A09 can be interfaced with an additional controller for advanced control or monitoring applications. The controller can be connected with the ion source and monitor module to provide increased flexibility and advanced control capabilities. Overall, KC-200A09 is an advanced ion implanter and monitor machine that offers superior accuracy and maximum flexibility for a wide range of ion implantation techniques. With its improved Digital Signal Processing capability, high-accuracy positioning, and Dual-Table ion source configuration, the tool offers improved beam stability and accuracy. In addition, its easy-to-use graphical user interface and additional controller options provide users with enhanced control and monitoring capabilities.
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