Used NANO-MASTER NIE 4000 #9182949 for sale

Manufacturer
NANO-MASTER
Model
NIE 4000
ID: 9182949
Vintage: 2016
Ion beam etching system, 14.5" Physical etching with accelerating Ar ions Patterned with thick resist for masking Energetic ion flux during etching overheats: Substrate Resist Substrate temperature: <50°C SS Cube ion beam chamber DC Ion gun: 12 cm, 1000 V, 500 mA DC Motor driven: SS Shutters Ion beam neutralizer Ar MFC Chilled water cooled: Substrate platen, 6" Wafer rotation: 3-10 RPM Vacuum stepper motor Wafer tilt with stepper motor Pumped rotational seal Manual / Automatic wafer: Load / Unload Typical etch rates: Cu: 20 nm/min Si: 50 nm/min Etch uniformity: +/- 5% over 4" area Turbo pump: Base pressure with 500 1/sec: 5 x 10-6 Torr < 20 minutes < 2 x 10-7 Torr Base pressure with 1000 1/sec: 8 x 10-8 Torr Protect etched metal surfaces from oxidation Recipe driven Password protected Safety interlocked Missing part: Foreline pump 2016 vintage.
NANO-MASTER NIE 4000 is an ion milling equipment designed to provide high precision data and high surface flux rates. By using a focused ion beam (FIB), NIE 4000 creates nano-sized structures and materials from a variety of substrates. The machine features a high-quality, compact design, including two integrated chambers that can accommodate a wide variety of sample sizes. NANO-MASTER NIE 4000 system consists of a liquid nitrogen cooling unit, a computer-controlled operational unit, and a chamber where the ion beam is created and focused. At the center of the machine is the ion source, where the FIB is generated. This high-precision ion beam is capable of creating ultra-fine nanostructures from a variety of materials, including metals and thin film substrates. A fully automated gas conditioning unit helps to provide the highest quality data by removing any residual contaminants from the sample. NIE 4000 allows for accurate control over the ion beam energy, beam current, and focus. This allows for versatile fabrication with exact precision. With its specialized software package, NANO-MASTER NIE 4000 can also be used for imaging, precision depth profiling, and patterning. Additionally, the user interfaces allow for monitoring, automation, and user control. This makes it easy to customize a program to meet the user's specific fabrication needs. NIE 4000's integrated electrostatic lens provides a larger working distance, which helps to reduce ion penetration. Additionally, its large sample stage allows for more samples to be handled in a single run. Its enhanced computer-controlled operational tool ensures accurate and consistent data at the nanometer scale. NANO-MASTER NIE 4000 is an ideal asset for precision nanomaterials fabrication. Its advanced FIB technology and high-precision engineering provide superior performance and accuracy. NIE 4000 allows for greater customization, accuracy, and speed, making it an ideal choice for those looking for an advanced ion milling solution.
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