Used CANON MPA 500 Fab #9269097 for sale

CANON MPA 500 Fab is a high-precision mask aligner designed for the alignment and photolithography manufacturing of semiconductor wafers. It is capable of aligning up to eight wafers in the same exposure period and is designed for precision control with a high level of accuracy. The optical equipment provides a precise alignment range of ±30μm with a maximum deviation of ±15μm. CANON MPA 500FAB is designed for use in controlled clean-room environments, with an airtight dust-free design and special sealed ceramic door. The unit can provide an adjustable focus depth of between 0 and 2mm and a maximum focus lens with a numerical value of 0.5x. During operation, the air and the inner housing of the aligner are all filtered through a three-stage dust-removal system to ensure the highest quality environment. An ion beam source provides rigorous cleanliness by accelerating electrons directly onto the wafer to eliminate contaminating particles. MPA-500FAB is easy to operate with user-friendly graphical user interfaces. Its in-built pattern generators allow operators to quickly create their own customized stitching maps with multiple mask and photomask patterns. It also features fast writing, exposure, and alignment algorithms for a high-speed and low-cost exposure process. It is suitable for both single and multi-layer exposure and can produce large area exposure up to 225mm, or small exposed region up to 6.4mm. CANON MPA-500FAB is designed for flexibility and is compatible with a wide range of resist materials, including both positive and negative resists. It features a UV aligner, combined with a minimum feature size of 0.2μm, allowing for finer, cleaner masks to be created with submicron precision. CANON MPA 500-FAB is designed for precision and reliability with low breakdown probability rates. Its housing is made of high-grade stainless steel and has been sealed to prevent airborne particles from entering the unit. It is designed for speed and energy efficiency with low energy consumption and a short process cycle. It also features a self-diagnosis machine to provide feedback if any issues occur, helping to maintain and improve the performance and prevent downtime.