Used CANON PLA 500 FA #9105738 for sale

CANON PLA 500 FA
Manufacturer
CANON
Model
PLA 500 FA
ID: 9105738
Mask aligner.
CANON PLA 500 FA is a fully-automatic mask aligner, designed for applications such as photolithography, photomask, and thin film processing. This mask aligner comes equipped with several features that make it a reliable choice in the semiconductor fabrication industry. The most notable feature of CANON PLA 500FA is its high degree of accuracy. It is equipped with two auto-alignment stages that operate with a precision of less than 0.1 microns. This allows it to precisely align masks onto substrates such as wafers and other components with a high degree of accuracy. The mask aligner is also equipped with a unique, proprietary automatic wafer handling equipment. This system provides precise guidance for precise wafer placement and alignment in the machine. The unit also ensures that the wafers remain totally free of contaminants. It is integrated with a wafer gripper, allowing for easy pick and place of the wafers. PLA 500 FA has a patented optical alignment machine that enables precise registration of the mask and the substrate. The optical tool is coupled to a digital controller for precise accuracy. This asset also enables the use of special masks with low-profile patterns for precise masking and lithography. The mask aligner can easily be integrated with any cleanroom environment. It is designed with a highly efficient particle filtration model, providing three stages of cleanroom air filtration for improved particle control. The equipment also comes with an antistatic coating to protect the machines from harmful stray electric charge, improving the reliability of the machines. PLA 500FA is a reliable mask aligner for precise accurate substrate-mask alignment, and is ideal for applications such as photolithography, masking, and thin film processing. It features a high degree of accuracy combined with a unique wafer handling system, and an efficient particle filtration unit that is well-suited for modern semiconductor fabrication applications.
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