Used CANON PLA 501 FA #163500 for sale

CANON PLA 501 FA is a mask aligner that is used for a wide range of applications in photolithography. This type of aligner is an essential piece of equipment in the production of diverse parts and components in the semiconductor industry. It is used to create precise exposures on the photomask film and to transfer features from the masks to the substrate material. It is essential for obtaining precise results in the fabrication of many electronic parts, such as those found in the production of integrated circuits and other electromechanical components. The device is operated according to a high-precision alignment error control system that is able to achieve a high degree of accuracy by using a combination of autonomous and manual alignment techniques. In order to achieve the desired levels of accuracy, the machine consists of two main components: a laser point projector and a detector. The laser projector lets the user to position the reference points of the mask, while the detector scans the mask to verify the exact position and alignment. The reference points are then used to calculate the exact alignment from which the alignment of the substrate material is performed. The light sources used with this machine are typically of a wavelength-selectable type and can span from ultraviolet to infrared wavelengths. This allows accurate alignment of the mask over the substrate even when the alignment of the parts is not consistent. As a result, the machine is suitable for complex and challenging fabrication processes that require transference of intricate designs and features. CANON PLA-501FA is equipped with several useful accessories including a photomask viewer and a monitor that displays important information such as the magnified alignment images. Furthermore, the device comes with a dedicated local software which allows the user to control the device and input patterns directly into the device. This feature makes it much easier to create the desired patterns. In addition, PLA 501FA has several safety features and is equipped with standoff shields that prevent accidental exposure of personnel to radiation during the course of operations. The device also works seamlessly with a majority of substrates and aids in achieving high-precision alignment over a range of materials. Overall, PLA-501 FA is a top-of-the-line mask aligner that produces accurate results for a wide range of applications in modern photolithography. Its accurate alignment control, efficient operation, and variety of accessories make this device the ideal choice for a range of demanding photolithography processes.