Used CANON PLA 501 #9292378 for sale

CANON PLA 501 is a state-of-the-art mask aligner developed by CANON. It utilizes a widefield imaging technique, which allows the user to accurately align photomasks on wafers quickly and reproducibly. The machine consists of a controller, a projector, and a photomask holder. The controller enables the user to adjust the alignment of the wafer, photomask and imaging equipment, as well as control the exposure time and the light intensity. All these parameters can be pre-set to ensure repeatability and accuracy, and can be monitored and fine-tuned according to the user's needs. The projector is the core component of the machine. It is equipped with a high-resolution imaging system that provides an accurately focused image onto the wafer. This image is captured by the camera within the projector and is then digitally processed using the controller. The photomask holder consists of a stage on which the photomask is mounted. This stage can be controlled so as to accurately position and align the mask with the image on the wafer. The photomask holder also comprises of an integrated exposure unit featuring a powerful UV light source, allowing for the illumination of the photomask. In order to operate the equipment, all the above-mentioned components require to be calibrated according to the user's requirements, and connected to the controller. The machine is also equipped with an integrated quality control machine, which can identify any potential fault in the tool, and alert the user. Overall, CANON PLA-501 is an efficient and reliable mask aligner, ideal for the production of highly accurate and consistent devices. With its widefield imaging technique, the machine can deliver uniform and repeatable results with a very high accuracy. Consequently, this makes PLA 501 an ideal choice for making the latest and most advanced microelectronic devices.