Used HTG 84-3 #18003 for sale

HTG 84-3
Manufacturer
HTG
Model
84-3
ID: 18003
Wafer Size: 4"
Mask aligner BAUSCH AND LOMB Stereo zoom 7 Substrates: Up to 4" x 4" 500W Lamp 1000W Power supply.
HTG 84-3 is a state-of-the-art mask aligner designed with efficient photolithography processes in mind. This automated machine uses laser technology to accurately align and etch masks onto thin substrates. The equipment can produce patterns with a resolution up to 40 nm. The machine is equipped with an automated patterning system consisting of a stepper stage and an optics unit. The stepper stage works to position and align the mask patterning element exactly onto the substrate. The optics machine is used to read the coordinates necessary for the placement of the mask. In addition, the optics tool is also used to focus the laser beam which is used in the patterning process. The laser technology used in 84-3 is a nitrogen laser operating at power levels of up to 1.78 kW. This laser is designed to produce a highly accurate pattern with its precision machined components. The thin-film structure of the laser ensures repeatable precision in the pattern alignment and etching processes. The mask aligner is complemented by the software used for tool setups and feature recognition. The asset allows users to program tool settings, specify substrate characteristics, and register substrate layout. The pattern recognition capabilities allow the model to identify and measure complex spatial features, thus optimizing alignment and etching results. HTG 84-3 can process glass, quartz, alumina, and other thin-film substrates. The machine is equipped with a high-pressure cooling equipment, which ensures accuracy in all stages of the processing, as well as providing thermal stability in the final pattern. Furthermore, the system utilizes nitrogen gas in the laser cutting process, which minimizes surface contamination, increases process speeds, and allows for high-quality results in patterning. Overall, 84-3 mask aligner is a powerful tool which meets the needs of today's photolithography processes. With its versatile laser technology, state-of-the-art pattern recognition capabilities, and thin-film processing options, this machine is sure to elevate your production processes or research efforts to the next level.
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