Used MIDAS MDA-6000 #9308142 for sale

Manufacturer
MIDAS
Model
MDA-6000
ID: 9308142
Mask aligner.
MIDAS MDA-6000 is a state-of-the-art mask aligner, designed to provide precise mask alignment for the production of integrated circuits and semiconductors. The aligner features a high-energy source and an advanced optical alignment equipment that enables accurate alignment of the patterned metal mask to the wafer substrate. The high-energy source on MDA-6000 is designed for optimal alignment accuracy. It produces a uniform power density across the substrate, enabling precise alignment of the mask with the wafer. It also features an advanced error-correction control system, which compensates for any misalignment caused by thermal or other environmental effects, ensuring that the best possible results are achieved. The high-resolution optical unit of MIDAS MDA-6000 provides the best possible accuracy in the alignment process. It consists of a high-resolution CCD camera with auto-focus technology, designed to accurately measure the position of the mask relative to the substrate. The machine also features an innovative light-field microscope, which allows for easy alignment and measurement of the substrate pattern. In addition, MDA-6000 features an automated calibration tool, which optimizes the power of the source and the resolution of the optical asset for the desired alignment. This ensures that the best possible alignment results are achieved and that all process parameters are correctly set according to the production requirements. MIDAS MDA-6000 is also equipped with sophisticated process monitoring tools, which provide detailed feedback on the alignment process. This includes data on the power density, focus level, and optical alignment of the mask. It also provides a real-time display of the alignment results, enabling users to verify the accuracy of the mask alignment. MDA-6000 is an advanced, high-precision mask aligner, designed to provide superior alignment accuracy for the production of integrated circuits and semiconductors. Its high-energy source and advanced optical alignment model ensure precise alignment of the mask with the substrate, while its automated calibration equipment ensures the best possible results. Additionally, its process monitoring tools provide detailed feedback on the alignment process, ensuring accurate and consistent mask alignment with each production run.
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