Used PERKIN ELMER 340 #293643187 for sale

PERKIN ELMER 340 Mask Aligner is a lithography tool used for the production of microminiature photolithography masks. It is designed to expose a variety of mask layers, including chrome, quartz, and aluminum, using ultraviolet (UV) light. The Mask Aligner is electrically powered and is controlled via a Windows operating equipment. 340 Mask Aligner is designed for rapid and accurate alignment of optical masks. It features a microprocessor-controlled stage with a built-in auto-alignment feature that allows for extremely precise alignment of layers. The Mask Aligner also features a system of sensors, known as a shadow alignment mask, that allow it to accurately detect the position and orientation of layers being exposed. The Mask Aligner has a stage speed of up to 25 cm/s, allowing for rapid processing of layers. PERKIN ELMER 340 Mask Aligner is capable of producing good quality photolithography masks with a maximum resolution of 0.8 microns and minimum feature size of 1.2 microns. The Mask Aligner also features a laser beam incident alignment unit, which allows for extremely precise alignment of the masks, with an accuracy of 10 μm or better. This machine utilizes reflected laser light, which is able to detect the details of the smallest feature size, making it suitable for all kinds of substrate. The Mask Aligner also features an on-board integrated CCD camera for visual inspection of the masks. This is done by capturing images of the mask at different stages of lithography, and then sending the images to a computer for further analysis and comparison. This tool allows the user to quickly detect flaws, irregularities, and misalignment of the masks. The Mask Aligner features a quick-change LCD screen, enabling rapid switching between the various lithography processes. This allows operators to switch quickly from one process to another, reducing downtime and improving efficiency. The Mask Aligner also allows operators to save and recall different alignment settings for different masks, enabling them to quickly and precisely process multiple masks without having to adjust settings each time. 340 Mask Aligner is capable of producing high-quality photolithography masks for a variety of microelectronic devices and applications. With its high resolution and precision, this Mask Aligner can be used to produce masks for everything from nanoscale to advanced microelectronics.