Used QUINTEL / NEUTRONIX NV2 #162559 for sale

QUINTEL / NEUTRONIX NV2 Mask Aligner is a versatile piece of equipment used in the semiconductor industry for wafer processing. It uses a projection, alignment and imaging system to precisely align the reticle, or mask, onto the wafer and ensure that the pattern on the mask is accurately transferred onto the wafer surface. QUINTEL NV2 Mask Aligner utilizes a high-quality quartz-halogen lamp as the imaging source and a refracting Schmidt camera as the imaging lens. The lens focuses the light onto the reticle, which is then projected onto the wafer using an optical flat, also known as a stage. The stage is equipped with two galvanometric mirrors and a two axis flexure stage to enable precise alignment. NEUTRONIX NV2 Mask Aligner is designed to be extremely precise, with wafer to mask parameters being adjustable down to 10,000ths of an inch. This precision allows it to produce circuit routing patterns that are accurately aligned with the features on the reticle. NV2 Mask Aligner is also capable of producing 3D structures and nano-scale features on a wafer. A proprietary 3D scanner is incorporated into the system and a special software module is used to create and process the 3D structure. This allows QUINTEL / NEUTRONIX NV2 Mask Aligner to be used for creating advanced circuits that require three-dimensional structures such as very large scale integrated (VLSI) circuits. QUINTEL NV2 Mask Aligner is an incredibly versatile and precise tool for wafer processing. Its combination of high-precision imaging, 3D structure capability, and flexible alignment make it ideal for use in advanced semiconductor processing.