Used QUINTEL / NEUTRONIX Q 4006 #9053626 for sale

ID: 9053626
Mask aligner Tooling: 4" / 6" Masks being used: 5" / 7" Substrates: 2" Silicon Zoom microscope (2) Rotating turrets Objectives: 2x, 5x UV light source capability: 350 W / 500 W.
QUINTEL / NEUTRONIX Q 4006 is a fully automated, high performance wafer alignment and transfer tool dedicated to advanced Photolithography. It is a mask aligner that enables accurate and precise alignment of wafers onto substrates with high throughput. The tool has a compact footprint and is designed for superior performance in both photolithography and photomask applications. QUINTEL Q 4006 has a wide range of features and capabilities that make it a great choice for any photolithography application. The tool has a maximum alignment accuracy of 200 microns and a maximum wafer diameter of 8 inches. It also has a built-in camera to ensure accurate alignment and a vision system to provide real-time overlay information. The tool is capable of supporting multiple stages, including single-mode, double-mode, and multi-mode runs. Additionally, it includes the Advanced Alignment Function to allow for more advanced alignment strategies. NEUTRONIX Q 4006 utilizes advanced optical imaging technology and a proprietary optical interconnect design to ensure that alignment and transfer results are high quality. The tool also has several automation and user convenience features, such as automated sequencing of programs, a touch screen interface, and a wide range of data management options. These features allow for both batch and program-level operation with minimum interaction from the user. The tool's built-in safety features ensure that the alignment and transfer process is efficient and safe. Q 4006 is compliant with EU regulations for Class III products, and is designed to meet both RoHS and WEEE requirements. Additionally, the tool has an intuitive emergency stop switch and a guarded mechanism to prevent accidents during operation. QUINTEL / NEUTRONIX Q 4006 is a reliable and cost effective choice for high accuracy Photolithography applications. The combination of advanced features, automated user convenience, and robust safety features make it an ideal choice for any wafer alignment and transfer application.
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