Used TAMARACK 162D #9130935 for sale

TAMARACK 162D is a comprehensive mask generation and production equipment from MOCVD Mask Technologies designed for high-volume production. It has an advanced design for complex e-beam lithography applications with a wide range of mask generation features. The system utilizes an advanced step & repeat mask-generating stage that has precise motor-driven XYZ alignment and laser-aligned target points. This ensures that masks are accurately replicated at each stage. The mask generating software enables CAD level manipulation of features with advanced resolution capabilities. This provides the user with excellent control and precision for mask designs. The software also supports high-level complexity designs such as intricate line spacings and multi-level feature details. The machine utilizes a high-throughput process to generate the finest precision of mask patterns. It includes features such as a fast scan time and a high-resolution stage, which allow for large scale mask patterning. This includes features like a fully automated optical positioning unit and variable step sizes. The machine supports a wide range of exposures, including laser through-mask and e-beam. This allows for variable exposure times and accuracy while ensuring the highest quality results. In addition, it provides multiple levels of protective environment and control over the process. The mask generation stage supports masks with up to 12 levels/degrees-of-freedom, and accurate feature placement to 0.25 microns with a minimum linewidth of 5 microns. For mask production, it supports a variety of backing and substrate materials and has a full-spectrum of mask sizes. The design also provides support for multiple backside features. 162D is designed for high-speed, high-resolution, and high-volume production. Its features provide a cost effective manufacturing solution for mask production, which makes it ideal for companies looking to rapidly increase their mask production capacity. Its advanced design and processing capabilities give users the flexibility and control they need to achieve high level precision and accuracy for their mask designs.