Used KLA / ICOS CI-G10 #293591822 for sale

ID: 293591822
Vintage: 2007
3D Lead inspection system 2007 vintage.
KLA / ICOS CI-G10 is a Mask and Wafer Inspection Equipment used to meet the high-end, high-performance requirements of the semiconductor industry. The system is used to inspect critical features and monitor patterns built into masks and photomasks. It features state-of-the-art optics and optics technology, advanced image processing algorithm, and integrated defect review and meta-data management to support image. The performance and inspection capability of this mask and wafer inspection unit ensure it can be used for the inspection of the most complex layouts, including the inspection of logic, memory, and analog/mixed-signal applications. In addition, the machine can be used in production lines as well as in research and development. The unit is equipped with a Fully Automatic Die Positioner (FADP) for easy and precise sample positioning. The FADP is also supported by a sample stage aligner that allows automatic or manual alignment. This ensures the sample is consistently positioned on the field of view for accurate inspection. The advanced optics technology and integrated software technologies of this tool provide high-resolution images, clear contrast and bright, uniform lighting across the entire field of view. This ensures a wide inspection range, while minimizing pixel noise and providing contrast ratios up to 10,000:1. By providing optimized lighting, detecting even the finest defects is made possible. The asset is also equipped with an integrated, comprehensive defect review and meta-data management model. This allows users to easily review and manage inspected images and meta-data. In addition, the equipment can provide statistics on yield, defect count, defect isolability, and defect detection efficiency. KLA CI-G10 is a highly-capable Mask and Wafer Inspection System capable of providing verifiable and repeatable inspections. Its superior optics and high-resolution imaging capabilities, integrated defect review capabilities and advanced imaging algorithms make it an excellent choice for both production and research and development labs.
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