Used LEICA / VISTEC MIS 200 #9267741 for sale

LEICA / VISTEC MIS 200 mask and wafer inspection equipment is designed to provide automated, high-accuracy inspection of lithography masks and wafers. This system utilizes a highly advanced microscope with a digital camera unit to capture the full fidelity of mask and wafer images. The inspection machine includes a software package that includes autofocus and auto-exposure functions, making analysis and comparison of the high-resolution images fast and easy. The tool features a large imaging area to allow for mask and wafer inspection of many sizes and shapes. The motion control asset allows precise scan of whole chips or individual arrays, enabling precise imaging of even the smallest features. The microscope can also be configured with various magnification properties to accommodate different mask and wafer sizes. The model's software provides an easy-to-use, graphical user interface (GUI) and powerful analysis technology. It includes a variety of analysis parameters, including geometry recognition, comparison, and mask rule checking. This allows users to quickly and accurately determine whether a mask or wafer conforms to the desired design or specification. The equipment also features 2D image analysis, which enables users to check for defects that are difficult to detect using standard dimensional measurements. In addition to its automated features, LEICA MIS 200 mask and wafer inspection system also provides additional manual analysis capabilities. Specialized software packages provide users with extensive post-processing ability and analysis control, making it suitable for research, development, or failure analysis of masks and wafers. VISTEC MIS 200 mask and wafer inspection unit provides a comprehensive package for precise, automated inspection of lithography masks and wafers. Its robust motion control machine, advanced microscope, and powerful software with manual analysis capabilities make it suitable for multiple applications ranging from general inspections to research, development, and failure analysis.