Used NEONTECH NTM-60A #9161614 for sale

ID: 9161614
Vintage: 2010
Wafer mounters Currently installed in clean room 2010 vintage.
NEONTECH NTM-60A Mask & Wafer Inspection Equipment is a high-precision digital imaging system for automation of photo inspection requirements of masks and wafers in the semiconductor industry. The unit uses an advanced LED light source, full-HD image sensor, stereo microscope, and CCD vision technology to provide superior image capturing and analysis capability in a small footprint. The machine includes an LED light source that provides uniform illumination across the entire sample area. This eliminates optical distortions that can occur with traditional light sources, allowing for maximum precision and accuracy. The full-HD image sensor captures 4-megapixel image resolution at high frame rates, and is capable of displaying both pattern and optical data in a single image. NTM-60A includes a stereo microscope that is integrated with a CCD vision tool for fast and accurate pattern recognition. The microscope offers a range of magnifications with up to 1.25x native resolution for detailed inspection. The CCD vision asset provides powerful image analysis tools to detect and classify defects while the stereo microscope captures the images. In addition, the model is equipped with pattern-matching software to quickly identify defects or identify patterns. The software has been designed to recognize features such as defects in substrate, patterns on sample, tacky film removal, and others. This provides the ability to detect and classify defects quickly and efficiently. NEONTECH NTM-60A equipment includes an intuitive user interface and user-friendly software. This includes a footswitch for easy control, a touchscreen display for navigating through menus, and simple, easy-to-understand icons that allow for quick setup and use. The system is also versatile and can be used to inspect films, masks, and bare die on a wafer. Overall, NTM-60A Mask & Wafer Inspection Unit is an ideal solution for automation of photo inspection requirements of masks and wafers in the semiconductor industry. The machine provides superior image capturing and analysis capability with a wide range of features that allow for accurate and fast pattern recognition. Combined with its user-friendly interface, the tool is an ideal choice for production environments.
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