Used SDI SPV / PDM 3020 #9042454 for sale

SDI SPV / PDM 3020
ID: 9042454
Wafer Size: 8"
Semiconductor diagnostics system, 8".
SDI SPV / PDM 3020 is a mask and wafer inspection equipment. It is designed to provide a comprehensive and sophisticated set of inspection tools for mask and wafer production. It includes four main components: an automated wafer inspection system, an automated mask inspection unit, a panel inspection machine, and a manual component to support manual inspection. The automated wafer inspection tool uses a variety of sensors and imaging technology that detect and measure characteristics such as size, shape, defect density and electrical features on the wafer. It is capable of detecting errors, anomalies, and inclusions. The data it produces can then be analyzed by the asset to identify any discrepancies and help determine the yield of a production run. The automated mask inspection model provides detailed mask analysis, including deformities, topography, and defects. It is capable of detecting a range of errors including resist non-uniformity, dark grain defects, light contamination defects, pinhole, and critical dimension errors. The panel inspection equipment is designed to provide a wide range of measurements on panels or isolated devices. This includes measurements for performance characterization, power calibration, statistical process control (SPC), and yield analysis. The manual component of the system provides comprehensive inspection capabilities such as microscope-based analysis of mask quality, tooling evaluation, and wafer mapping. It employs advanced microscopy techniques such as brightfield and darkfield inspection, scanning electron microscopy, reflectance techniques, atomic force microscopy, and more. In summary, SPV / PDM 3020 mask and wafer inspection unit provides comprehensive and precise analysis of masks and wafers with high standards of accuracy. This machine is capable of detecting a wide range of errors and anomalies for increased yield performance. It also provides detailed measurements for yield analysis, process control, and performance characterization.
There are no reviews yet