Used TKK MAC-110MV1 #9375009 for sale

TKK MAC-110MV1 is a state-of-the-art mask and wafer inspection equipment designed by TKK Corporation. Featuring a camera-based high-resolution imaging system coupled with proprietary software algorithms for fast and accurate defect detection and analysis, MAC-110MV1 offers a superior level of quality assurance and control. TKK MAC-110MV1 utilizes advanced image acquisition technologies and wide-optical optical zoom microscope to gain insight into microscopic topography of wafers or masks. The unit's wide-range of features include a tool-less adjustable LED light source, optional polarization and contrast as well as software-based filter options for image correction and enhancement. All components are housed in a sturdy frame with lockable casters allowing for easy and secure handling and transport. For image acquisition MAC-110MV1 uses a 5 mega-pixel high-definition camera, allowing for individual characteristics of nearly 1000 wafers to be captured in a single 25-second-long operation. Its dedicated task-specific software package includes automated wafer detection, automatic pattern recognition and precise defect classification. All data generated by TKK MAC-110MV1 can be stored and analyzed remotely on a server or client PC. To ensure sample safety and producible inspection results, numerous settings are available to optimize image acquisition and alignment parameters according to the individual wafer characteristics. In addition, the machine can be integrated with a wide variety of vertical launch stages to accommodate for wafers or masks with different thicknesses. MAC-110MV1 is capable of detecting and differentiating between small (sub-micron) and large (over-micron) defects, as well as tiny minute particles. A 3D function is available to accurately measure defects on multi-layer wafers. Its intuitive user interface enables operators to quickly configure imaging settings such as camera gain, aperture, contrast, sharpness and image magnifications. Furthermore, the tool can perform statistical analysis of overall patterns, wafer size and number of defects detected. TKK MAC-110MV1 is an ideal solution for in-line and off-line quality control in the manufacture of integrated circuits components. Thanks to its advanced features and innovative technologies, it's an industry leader in mask and wafer inspection.