Used TKK MAC-110MV1 #9399123 for sale

TKK MAC-110MV1 is an automated mask and wafer inspection equipment designed to efficiently inspect fabricated masks and wafers. The system is equipped with an image acquisition unit, an image analysis machine, and a high-speed handling tool. The image acquisition asset utilizes two imaging modes, RGB and 1000X optical, allowing for fast and precise imaging of patterns or defects present on the mask or wafer. The image analysis model applies a variety of algorithms and filters to the obtained images to quickly identify any defects. The high-speed handling equipment then removes defective masks and wafers for post-production inspection. The system is capable of a variety of inspection tasks, including wafer inspection and defect identification, mask pattern registration, and pattern quality evaluation. It can check for foreign material, scratches, contaminated masks, pattern placement accuracy, and more. It also features automatic defect detection and classification in real time, and the ability to export detailed info on the detected defects. MAC-110MV1 is equipped with an intuitive software interface, allowing for easy operation and customization of inspection parameters and settings. It can also be used in combination with wafer exposure systems and mask exposure systems, enabling simultaneous patterning, exposure, and inspection. The unit is also designed for easy installation and maintenance, with replaceable components for fast servicing and scheduled maintenance. TKK MAC-110MV1 is capable of performing a wide range of important inspection tasks, allowing for increased quality control. It is incredibly fast and efficient, enabling quick checking of large numbers of masks and wafers. The combination of precise imaging and advanced analysis algorithms helps to ensure consistent accuracy. The robust design and replaceable components also make this machine ideal for extended use in industrial production environments.