Used TKK MAC-92MV1 #9399120 for sale

TKK MAC-92MV1 is a state-of-the-art mask and wafer inspection solution developed by TKK Corporation. The equipment is capable of rapidly analyzing a wide range of wafers and masks, including photomasks, layout masks, and patterned wafers. The system is capable of acquiring images at high resolution and speed, which allows for quick and accurate inspection of defects and mask patterns. MAC-92MV1 also allows operators to measure images and create 3D models of the topography of the wafers or masks, enabling the accurate assessment of fine details and blemishes. It supports defect review with both 2D and 3D images, with the option to switch between a variety of images and analysis. The unit also features a simple user interface and a range of inspection modes, allowing for more flexibility and productivity. Data storage and software are also provided for easy storage, retrieval, and review of images and data throughout multiple product cycles. TKK MAC-92MV1 machine is also equipped with an onboard computer that provides real-time processing of images and pattern data in order to detect any defects or discrepancies quickly and accurately. The user-friendly on-board computer and software ensure efficient operations throughout the mask and wafer inspection process. The tool also boasts a wide range of in-depth reports and data analysis, which allow for more detailed inspection of the mask or wafer being inspected. MAC-92MV1 provides an all-in-one solution that enables high-quality, reliable mask and wafer inspection with the latest technologies. It is an ideal solution for advanced processors looking to obtain optimal performance and speed in their inspection process.