Used TKK MAC-92MV1 #9399121 for sale

TKK MAC-92MV1
ID: 9399121
Overlay measurement systems.
TKK MAC-92MV1 is a professional grade mask and wafer inspection equipment. It combines a novel high-resolution imaging technology with a comprehensive feature-rich software suite in order to produce detailed and comprehensive inspection results. MAC-92MV1 system features a powerful high-definition imaging subsystem. This utilizes an advanced CCD camera, high-powered optics and a precision high-resolution x-y stage unit. This combination allows for ultra-precise imaging across a variety of substrate materials, with pixel resolution and viewing window sizes of up to 1μm. TKK MAC-92MV1's visual inspection software suite is capable of detecting defects in masks and wafers, including isolated, isolated small, and large defects, as well as discrete defects. It also provides tools for defect characterization, and the ability to store and recall inspection results. The machine also allows for annotation of defects, so that reports and defect images can quickly and accurately be shared with other inspection personnel. MAC-92MV1 is ideal for inspection of masks and wafers in R&D and production environments, providing high-precision images of specific process failures, non-conformances or potential process issues. It is also an excellent diagnostic tool in data analysis, helping to identify the source of a defect or other issue. TKK MAC-92MV1 tool is also designed to be easy to use, with intuitive and graphical user interfaces. It can be easily integrated into automated production environments, as well as manually operated in R&D laboratories or inspection processes. With its modular design, the asset can easily be upgraded with new features, as needed, for even greater efficiency and accuracy. MAC-92MV1 model is a robust, versatile and dependable solution for mask and wafer inspection, with the highest quality and precision images available, precise defect measurements and automated analysis capabilities. Its feature-rich software suite and precise, high-definition imaging make it an industry standard for mask and wafer inspection processes.
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