Used WITHLIGHT OPI-305 #9382260 for sale

WITHLIGHT OPI-305
ID: 9382260
Measuring system 2009 vintage.
WITHLIGHT OPI-305 is a mask and wafer inspection equipment designed to inspect and detect particulate contaminants from the surface of mask and wafer substrates. The system provides high-resolution imaging for both particles and particles embedded in substrates. OPI-305 utilizes a laser-diode-light source for capturing images of particles. The captured images are then digitally analyzed with WITHLIGHT proprietary digital image processing algorithms. WITHLIGHT OPI-305 offers high-quality image resolution of 456x435 pixels. This allows for maximum resolution and sensitivity to particles, enabling detection of particles up to 1.2 microns in diameter. The laser diode light source is designed to minimize heat generation on the substrate and ensure low levels of bright-field illumination. OPI-305 incorporates advanced optics that allow for simultaneous imaging at various magnifications. This enables higher-resolution images at higher magnifications as well as inspection of multiple substrates at the same time. The unit also has a built-in darkfield illumination, which facilitates particle detection. WITHLIGHT OPI-305 includes advanced 3D imaging capabilities, which allow for 3D reconstruction and analysis of the surface topography to detect particulate contaminants. The machine also has a flexible, programmable inspection protocol, which is used to capture images of particulate contaminants from multiple substrate surfaces that may have different surface topology. OPI-305 includes an intuitive user interface which allows for easy operation and data analysis. It also includes a number of pre-programmed inspection protocols that can be used for a variety of inspections and particle detection tasks. WITHLIGHT OPI-305's design ensure repeatable, reliable results, with a high degree of flexibility and repeatability. Its intuitive user interface and digital image processing algorithms ensure accurate inspection results. It's high-resolution imaging, detection capabilities, and 3D imaging make it an ideal tool for mask and wafer inspection.
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