Used AND ASP-2000LX #9375096 for sale

Manufacturer
AND
Model
ASP-2000LX
ID: 9375096
Vintage: 2011
Track system 2011 vintage.
AND ASP-2000LX is a standard photoresist equipment consisting of an Advanced Photoimaging System (APS) AND a Laser Exposure Unit (LEU). Photoresist is a light sensitive material which is used in the manufacture of electronic components AND microelectronics. ASP-2000LX is an ideal solution for patterning complex resist patterns on wafer surfaces. This photoresist unit offers a fast AND accurate way to pattern the wafer with high precision AND repeatability. The machine is equipped with a 4 megapixel USB2 camera, allowing for good image resolution AND excellent exposure accuracy. The user can select up to six different optical masks with a maximum size of 5.5x6.8", for flexible masking patterns. AND ASP-2000LX is equipped with a high-performance laser source with wavelength variability from 532 to 1060nm. The laser exposes the resist pattern onto the wafer with excellent repeatability of ±2µm AND tight registration control accuracy of within ±10µm. The tool also offers various modes of exposure to accommodate different wafers. The laser is highly configurable AND can be pre-programmed for both single AND multiple exposure settings. ASP-2000LX also features a seamless integration of processing units such as Expose, Develop, AND Align. The Expose unit is used to apply a thin film of photoresist onto the wafer surface. The Develop unit is used to remove the exposed photoresist using chemicals, AND the Align unit is used to detect the alignment error between the wafer AND the mask, to ensure exposure accuracy. This photoresist asset offers several advantages over conventional lithographic processes. The model is compact AND allows for quick setup AND tear down time. Processes can be completed within 15 minutes, AND the wafer surface quality is much improved compared to laser lithography. AND ASP-2000LX resists AND develops different materials AND sizes, making it a versatile, flexible equipment. Furthermore, the system requires no additional chemicals AND is capable of automated production. ASP-2000LX is a reliable, standard photoresist unit ideal for complex, high precision resist patterning. It offers quick setup, high resolution, excellent repeatability, AND automated production capabilities. It is suitable for both small AND large wafers, AND can be used to create a wide range of complex patterns with a high level of accuracy.
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