Used ARGUS INTERNATIONAL 9324 #9026013 for sale

Manufacturer
ARGUS INTERNATIONAL
Model
9324
ID: 9026013
Vintage: 1999
LPI spray coater With tack dry oven Currently installed 1999 vintage.
ARGUS INTERNATIONAL 9324 is a high-precision photoresist equipment designed for professional usage in microelectromechanical systems (MEMS) production. The system allows precise exposures through its patented maskless lithography process using a Digital Light Processing (DLP) platform. Its wide range of wavelengths enables the user to experiment with a variety of resists and materials. Additionally, the exposure time is adjustable, which allows more precise results. 9324 uses a solid-state light source that can be switched/controlled to provide different wavelengths. This makes it ideal for micro and sub-micro lithography projects and provides optimum focus conditions for various objects. Compared to other photoresist systems, the ARGUS ARGUS INTERNATIONAL 9324 guarantees excellent long-term installation stability and minimal maintenance requirements. It also features an automatic calibration unit which ensures precise exposure dose at all times. The full field of view provided by 9324 is 10" to 6.14", while the maximum resolution is 40µm for rectangular structures and 80µm for round structures. It can handle samples up to 8" by 6.14" and its high fidelity and accuracy provides optimum conditions for different etchings. The machine is equipped with a wide range of programs that cover a variety of applications, such as layers etching, thick and thin oxide layers, dense and thin metal layers, protective coatings, etc. Moreover, all processes related to photoresists can be monitored by the automated control tool provided by ARGUS INTERNATIONAL 9324. This asset permits the user to adjust the exposure time, the dose, and the number of processes, as well as to monitor the development, imaging and etching. 9324 offers an excellent balance between versatility and performance. Its patented maskless lithography ensures high accuracy and it can be easily integrated with the majority of production systems available on the market. Therefore, this photoresist model provides an ideal solution for university research labs or production line facilities.
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