Used BREWER SCIENCE CEE 1100 Custom #136934 for sale

ID: 136934
Programmable vacuum hot plates for up to 500 x 500mm substrates PID temperature programmer Maximum temperature: 280°C with 0.1°C resolution (10) User programs for bake temperature, time, and bake method Bake methods: proximity, soft, or hard contact Lift frames: fully programmable controlled loading of substrate onto hotplate Auto cooling cycle to speed cool-down.
BREWER SCIENCE CEE 1100 is a custom photoresist equipment designed for producing finer and more complex structures. Photoresists are polymeric materials that are applied onto substrates and then exposed to light in order to create patterns and structures. The CEE 1100 consists of a chemical formulation, integrated exposure and imaging system, and a chemical development process. This particular product is specifically designed for the most complex photolithography workflows. The chemical formulation of the CEE1100 consists of a binder containing three components; the organic film forming, an acid compound that contributes to the cross-linking and an initiator that initiates the polymerization of the binder. This formulation allows for fast exposure, high resolution imaging and etching, and high sensitivity to a broad range of wavelengths. The integrated exposure and imaging unit is composed of a radiation source that produces the right type of light, a lens that focus the light, and an articulating arm that can be adjusted to ensure that the light is of the correct intensity to expose the photoresist. Additionally, it provides an image of the photoresist after exposure, allowing the user to check the image quality and make any necessary adjustments before developing the photoresist. Lastly, the chemical development process uses an acidic developer to dissolve any unexposed photoresist. This leaves patterns in the exposed photoresist that have been created by the exposure machine. The developers can be formulated for various time/temperature protocols, making the process compatible with varying substrates and applications. In summary, BREWER SCIENCE CEE 1100 Custom photoresist tool is designed to provide users with advanced capabilities in photolithography. It consists of an innovative chemical formulation, an integrated exposure and imaging asset and a chemical development process that allow for faster and more complex exposure, imaging and etching processes. With the CEE 1100, users can produce finer and more complex structures with greater accuracy and speed.
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