Used BREWER SCIENCE CEE 3000 #9253480 for sale

BREWER SCIENCE CEE 3000 is a next-generation, ultra-high-resolution photoresist equipment designed to enable the development of high-end, semiconductor applications. The system consists of a resist dispense stand, chemical supply and delivery module, calibration station, and a powerful light source. The resist dispense stand utilizes patented SiroccoHapTec resist-dispensing technology to safely and accurately place photoresists on semiconductor wafers with small features. This ensures the wafers are accurately presented for alignment and imaging with the powerful light source. The chemical supply and delivery module is designed to provide a consistent and precise supply and delivery of photo resists and developers. The calibration station comes with unique EasyCal software, allowing for accurate resist calibration resulting in excellent resolution and pattern transfer. The LCD monitor is used to precisely control exposure time and intensity of light for the resist patterning. It also provides simple graphical user interface to control wafer exposure. The powerful light source is used for photolithography and is capable of generating intense, uniform light. This light source is capable of producing high-volume throughput for advanced feature sizes, and offers huge exposure time flexibility to accommodate a variety of process needs. CEE 3000 is designed to be an advanced, easy-to-use photoresist unit that simplifies lithography processing and enables advanced semiconductor production. This machine is ideal for those working with microelectronics materials, thin-film materials, and semiconductors. The tool's precise resist imaging capabilities, accurate calibration, and powerful light source enable the user to produce complex and intricate patterns quickly and easily.