Used CHEMALUX 100 #9231353 for sale

CHEMALUX 100 is an industry leading photoresist equipment designed for producing high definition patterns with micron accuracy. The system combines the performance of positive photoresist with chemistries compatible with a wide range of imagesetters, laser direct writers, and electron beam scanners. As the processing steps are simplified, user-friendly, and environmentally friendly, such resist systems are a preferred material for the development of high resolution patterns that are used in various electronic applications. 100 is a positive photoresist unit which consists of a photosensitive resist, developer and stripper solutions. The photosensitive resist is a light-sensitive material composed of a mixture of chemicals in solution which, when exposed to light, form an insoluble polymeric material that acts as a protective layer, preventing further etching. The developer is a strong basic solution that dissolves the exposed photosensitive layer, while the stripper is a non-solvent solution that removes the unexposed photosensitive layer. The machine has been designed with several advanced features which allow for improved performance, accuracy, and efficiency in the patterning process. Firstly, the tool's photosensitive resist has a low dissolution rate which remains stable during the etching process, resulting in accurate patterning replication even when high temperatures are used. Secondly, the resist also has a high resolution which enables the production of patterns down to a few microns in size. For example, CHEMALUX 100 is suitable for producing patterns of 0.5μm X 1μm. Finally, the resist asset's patterning is optimized by the use of image reversal technology where a positive image can easily be reversed into a corresponding negative image. Overall, 100 is a high performance photoresist model that facilitates the fast and precise production of high resolution patterns for various electronic applications. The equipment's advanced features and easy to use process result in accurate patterning and enable users to produce patterns with micron accuracy, making it the preferred choice for photoresist systems.