Used CND PLUS CIE-3D02(04)-C #9223038 for sale

CND PLUS CIE-3D02(04)-C
Manufacturer
CND PLUS
Model
CIE-3D02(04)-C
ID: 9223038
Vintage: 2010
Developer system 2010 vintage.
CND PLUS CIE-3D02(04)-C is a high performance Photoresist Equipment designed for precision deep etching applications in high-tech industries. This system is used in various manufacturing processes where accurate and repeatable results are essential. CND PLUS CIE-3D02(04)-C utilizes a unique combination of exposure technology and substrates to deliver superior etching performance and accuracy. CND PLUS CIE-3D02(04)-C unit is a deep etching machine that combines multiple elements to create precise underlying structures for integrated circuits, wafers, semiconductors, and other micro-manufactured devices. The tool includes a high-precision laser exposure head, an auto-indexing wafer transport asset, a high-performance CASS stepper control, and an advanced resist material and exposure technology. All components are integrated together to provide a complete deep etching solution for a range of high-tech industries. This model reduces the need for multiple photo-resists which can be costly, time-consuming, and often impractical for complex deep etching applications. An additional benefit of the equipment is its portability. It is designed to be installed in mobile, modular micro-manufacturing environments, making it easy to use at a variety of locations. CND PLUS CIE-3D02(04)-C supports laser exposure of a wide variety of resist materials, including photoresist and negative resist. The system is designed to provide accurate and repeatable exposure results with a resolution of 0.1 μm. This precision is essential for micromachining, integrated circuit fabrication, and other high-tech applications. The laser-based exposure head is designed to adjust exposure times in µ seconds for optimal results. Furthermore, the stepper control is designed for enhanced resolution and higher repeatability for the automated exposure cycles required for complicated and delicate deep etching. CND PLUS CIE-3D02(04)-C is designed to be efficient, reliable, and precise, enabling multiple deep etching applications in a single process. With its tight controls, the unit is ideal for use in a variety of industries, including microelectronics, optoelectronics, integrated circuit fabrication, and wafer fabrication. For these applications, CND PLUS CIE-3D02(04)-C machine provides the highest accuracy and performance available.
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